What does XES stand for?

Technical examples described focused on structural and chemical analyses of differently processed HfSiO-based gate stacks on Si and SiGe, and emphasized a combined use of multiple techniques, including (i) synchrotron-based x-ray photoelectron spectroscopy (XPS) and x-ray absorption spectroscopy (XAS), and (ii) transmission electron microscopy-based Z-contrast imaging and electron energy loss spectroscopy (EELS).

Energy dispersive X-ray analysis and X-ray photoelectron spectroscopy verified that the TFS[I.

These include X-ray photoelectron spectroscopy (XPS) (2-7), Auger electron spectroscopy (AES) (8-12), energy dispersive X-ray (EDX) analysis (13-15), IR spectroscopy (16-21), and transmission electron microscopy (TEM) (8, 22).

The isotherm in the chemisorption region for this study was of the Langmuir type, according to experimental data fitting and as observed by X-ray photoelectron spectroscopy (XPS) analyses.

Attenuated Total Reflection Fourier Transform Infrared spectroscopy, X-ray Photoelectron spectroscopy, protein absorption and Fluorescence imaging were used.

Non-traditional techniques, including Auger electron spectroscopy, X-ray photoelectron spectroscopy, Mossbauer spectroscopy, and cathodoluminescence microscopy, are also beneficial in determining mineralogical interactions of processed materials.

Treated and untreated surfaces were analyzed using X-ray photoelectron spectroscopy (XPS).

The techniques available for composition determination of homopolymers and copolymers and other recent modern techniques such as X-ray photoelectron spectroscopy, atomic force microscopy, microthermal analysis and scanning electron microscopy and energy dispersive analysis using X-rays are also included.