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What does TCVD stand for?

TCVD stands for Thermal Chemical Vapor Deposition

This definition appears very rarely and is found in the following Acronym Finder categories:

  • Science, medicine, engineering, etc.

Other Resources:
We have 3 other definitions for TCVD in our Acronym Attic

Samples in periodicals archive:

Contributors cover epitaxy by rapid thermal chemical vapor deposition, molecular beam epitaxy growth techniques, ultra-high vacuum and chemical vapor deposition, defects and diffusion in SiGe and stained Si, stability constraints in SiGe epitaxy, electronic properties of strained Si/SiGe and silicon alloys, carbon doping and contact metallization of SiGe, and selective etching techniques for SiGe/SI.
Project Category: Chemistry-Nanotechnology Project Title: The Effects of Gas Pressure on Carbon Nanotube Synthesis by Thermal Chemical Vapor Deposition Teacher Recipient - Science Teacher of the Year --Teresa Clark, Advanced Biology and Honors Science Research, Hamilton High School - Chandler, Ariz.
CVC provides cluster tool manufacturing equipment for the data storage and semiconductor industries, including Physical Vapor Deposition (PVD), Metal-Organic Chemical Vapor Deposition (MOCVD) and Rapid Thermal Chemical Vapor Deposition (RTCVD).