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NIST has demonstrated a higher accuracy and higher spatial resolution inverse solution method for determining dopant profiles from scanning capacitance microscope (SCM) images of silicon transistors.
Such innovations have proven so useful that whole subgroups of SPMs have sprung up, including magnetic force and magnetic resonance force microscopes, scanning capacitance microscopes, and scanning conducting ion microscopes.
Chipworks will also use their in-house Scanning Capacitance Microscope to look inside the technology at the detailed doping characteristics of the devices.