What does RTA stand for?

As well as being used for quality control of polysilicon precursors in solar cell manufacturing, the EasyTube research systems can be used for the deposition of other films, including amorphous silicon, Polysilicon, silicon nitride, high- or low-temperature silicon dioxide, silicon and silicon-germanium epitaxy, transparent conductive oxides (SnO2, ZnO, etc), sulfurization, selenization, rapid thermal annealing, POCl3 and other related diffusion-driven processes needed for next-generation silicon and copper indium gallium diselenide (CIGS) solar cell process optimization.

But such "gettering' processes can take 16 or more hours--far too long to be useful with the rapid thermal annealing techniques being developed for the processing of much smaller, very-large-scale-integration chips, according to MIT materials scientist Jacek Lagowski.

Sulfurization, Selenization, Rapid Thermal Annealing, POCl3 and other related diffusion driven processes needed for next generation Silicon and CIGS solar cell process optimization.

Applied Materials' single-wafer front-end process technologies include rapid thermal annealing, the growth of oxide thin films, and the deposition of silicon nitride and polysilicon thin films.

These include fundamental patents around the area of rapid thermal annealing.

We are utilizing RTP Centura systems for rapid thermal annealing process steps both in production and in our development fabs as a key tool for future process development.

IBM: News ), including fundamental patents of rapid thermal annealing.

Rapid thermal annealing of implanted dopants in the first layer of epitaxial polysilicon is essential in order to achieve the very steep doping profiles required in the base and emitter regions of these transistors.