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What does PERIE stand for?

Plasma Enhanced Reactive Ion Etch


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This definition appears very rarely and is found in the following Acronym Finder categories:
  • Science, medicine, engineering, etc.

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Pea Ridge National Military Park (US National Park Service)
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Physical Education and Recreation Instructor
Political Economy Research Institute
Public Employees Retirement Inc.
Public Entity Risk Institute
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Period (US DoD)
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Perspective Image Generation and Exploitation
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Phonetic Experimental Research at the Institute of Linguistics, University of Stockholm (Sweden)
Penalty Enforcement by Registration of Infringement Notice (Australia)
Pedagogical and Educational Research Information Network for Europe (European Union)
Personnel Information System
Periodic Intelligence
Periodic Intelligence Report
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Samples in periodicals archive:
Offers leading plasma source technologies including Plasma Enhanced Reactive Ion Etch (PERIE), Inductively Coupled Plasma (ICP) and M0RI(TM) within a unique single chamber package of high performance combined with low footprint and costs.
Offers leading plasma source technologies including Plasma Enhanced Reactive Ion Etch (PERIE), Inductively Coupled Plasma (ICP) and M0RI(TM) within a unique single chamber package of high performance combined with low footprint and costs.
Offers leading plasma source technologies including Plasma Enhanced Reactive Ion Etch (PERIE), Inductively Coupled Plasma (ICP) and M0RI(TM) within a unique single chamber package of high performance combined with low footprint and costs.
Trikon's technology products include: Omega(R) 201 Plasma Enhanced Reactive Ion Etch (PERIE) (medium density) and Inductively Coupled Plasma (ICP) (high density).
Omega(R) 201+ Offers leading plasma source technologies including Plasma Enhanced Reactive Ion Etch (PERIE), Inductively Coupled Plasma (ICP) and M0RI(TM) within a unique single chamber package of high performance combined with low footprint and costs.
Omega(R) 201+ Offers leading plasma source technologies including Plasma Enhanced Reactive Ion Etch (PERIE), Inductively Coupled Plasma (ICP) and M0RI(TM) within a unique single chamber package of high performance combined with low footprint and costs.
Omega(R) 201+ Offers leading plasma source technologies including Plasma Enhanced Reactive Ion Etch (PERIE), Inductively Coupled Plasma (ICP) and M0RI(TM) within a unique single chamber package of high performance combined with low footprint and costs.
It features Trikon's plasma source technologies in a single chamber format, including the M0RI(TM), Plasma Enhanced Reactive Ion Etch and Inductively Coupled Plasma, and combines high performance etching with low footprint and costs.

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