Table 4: World High Density Plasma Chemical Vapor Deposition (CVD) Market (2012): Percentage Share Breakdown of Revenue by Leading Players (includes corresponding Graph/Chart) II-5 Table 5: World Low Density Plasma Chemical Vapor Deposition (CVD) Market (2012): Percentage Share Breakdown of Revenue by Leading Players (includes corresponding Graph/Chart) II-5 Table 6: World Low Density Plasma Non-Tube Low Pressure Chemical Vapor Deposition (Non-Tube LPCVD) Market (2012): Percentage Share Breakdown of Revenue by Leading Players (includes corresponding Graph/Chart) II-5
What does PCVD stand for?
PCVD stands for Plasma Chemical Vapor Deposition
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Samples in periodicals archive:
With exclusively licensed commercial rights to nanotube technology developed at some of the world's most respected research universities, the NanoPolaris IP portfolio includes patents and patent applications claiming nanotube compositions of matter and general manufacturing techniques such as chemical vapor deposition synthesis, plasma chemical vapor deposition synthesis, purification, solubilization, separation of certain types of tubes, coatings, functionalization, and manipulation.
BASIC THERMAL CHEMICAL VAPOR DEPOSITION 33 TABLE 9 TECHNICAL ADVANTAGES OF THE CHEMICAL VAPOR DEPOSITION PROCESS 34 Coating Process 35 METALLO ORGANIC CHEMICAL VAPOR DEPOSITION 35 TABLE 10 TECHNICAL ADVANTAGES OF METAL ORGANIC CHEMICAL VAPOR DEPOSITION 36 ATMOSPHERIC PRESSURE CHEMICAL VAPOR DEPOSITION 36 TABLE 11 TECHNICAL ADVANTAGES OF ATMOSPHERIC PRESSURE CHEMICAL VAPOR DEPOSITION 37 LOW-PRESSURE CHEMICAL VAPOR DEPOSITION 37 TABLE 12 TECHNICAL ADVANTAGES OF LOW-PRESSURE CHEMICAL VAPOR DEPOSITION 37 PLASMA-ENHANCED CHEMICAL VAPOR DEPOSITION 37 TABLE 13 TECHNICAL ADVANTAGES OF PLASMA-ENHANCED CHEMICAL VAPOR DEPOSITION 37 HIGH-DENSITY PLASMA CHEMICAL VAPOR DEPOSITION 38 TABLE 14 TECHNICAL ADVANTAGES OF HIGH-DENSITY PLASMA CHEMICAL VAPOR DEPOSITION 38 Tetra-Ethoxysilane Ozone Chemistry 39
An STTR grant (Phase 1) will be a joint research project between GT Equipment Technologies and the University of New Hampshire to develop a new, more efficient and cost-effective atmospheric plasma chemical vapor deposition process for producing the coatings that are used in the manufacture of solar cells and other processes, including semiconductor related coatings.
Applied's market share will increase from 21% to 24% in the dielectric etch sector (market leader Tokyo Electron); from 31% to 51% in the metal etch sector (taking lead away from Lam Research (Nasdaq:LRCX)); from 35% to 36% in the metal etch sector (market leader Lam Research); from 57% to 77% in the high-density plasma chemical vapor deposition (HDPCVD) sector (market leader Applied Materials); from 41% to 65% in the plasma enhanced CVD (PECVD) sector (taking lead away from Novellus (Nasdaq:NVLS)); from 62% to 68% in auto defect review sector (market leader Applied Materials); from 13% to 18% in the CD-SEM sector (market leader Hitachi (NYSE:HIT)); from 10% to 13% in the wafer defect inspection sector (market leader KLA-Tencor (Nasdaq:KLAC)).
Patents 4,226,897 and 5,470,784) cover innovative processes for the manufacture of semiconductor devices using plasma chemical vapor deposition, including the use of a gradient electric field in a reactor and cluster tool reactors for multi-chamber processing.
Previously, on March 31, Watkins-Johnson announced that it sold the Semiconductor Equipment Group's high-density plasma chemical vapor deposition intellectual property assets and associated hardware to Applied Materials, which resulted in a pre-tax gain of $9 million.
a wholly owned subsidiary of Watkins-Johnson Company (NYSE:WJ), announced today that it has completed the sale of its high-density plasma chemical vapor deposition (HDPCVD) intellectual property assets plus associated inventory and hardware to Applied Materials, Inc.