today introduced an easy-to-adopt Optical Proximity Correction (OPC) acceleration tool that will significantly shorten OPC cycle time and reduce OPC tool license usage through its proprietary pattern-centric approach.
This partnership is the continuation of a successful relationship that has been in place since IBM and Mentor first started working together on model-based optical proximity correction (OPC) solutions for the 130nm node, and extends the collaboration we both described last February around the Cell Broadband Engine(TM) processor," said Joseph Sawicki, vice president and general manager of the Design to Silicon Division at Mentor Graphics.
This partnership is the continuation of a successful relationship that has been in place since IBM and Mentor first started working together on model-based optical proximity correction (OPC) solutions for the 130nm node, and extends the collaboration we both described last February (http://www.
Brion Technologies, an ASML company, today announced the availability of Tachyon[TM] Lithography Aware Design (LAD), an extension of the company's Tachyon suite for optical proximity correction (OPC) verification and OPC application.
YOKOHAMA, Japan -- Brion Technologies, an ASML company, in collaboration with Japan's Semiconductor Technology Academic Research Center (STARC) will work to develop and test a complete design-for-manufacturing (DFM) workflow, enabled by Tachyon, Brion's highly accurate and ultrafast optical proximity correction (OPC), resolution enhancement technology (RET) and OPC verification system.
The Tetra III controls trench depths across quartz masks to <10A and reduces critical dimension (CD) loss to <10nm--enabling the use of alternating phase shift mask (PSM) and aggressive optical proximity correction techniques in customers' most critical device layers.
Brion's products and technology will complement and reinforce ASML's core lithography business, while ASML will help to accelerate Brion's growth into the growing market for Verification, Reticle Enhancement Technology (RET) and Optical Proximity Correction (OPC), by providing key lithography know-how.
