A maker of process control metrology systems for the analysis of semiconductors, integrated circuits and flat panel displays, Nanometrics' systems utilize spectroscopic reflectometry and ellipsometry, optical critical dimension technology, overlay registration, optical profilometry, and extreme dark field (EDF) imaging technology.
What does OCD stand for?
OCD stands for Optical Critical Dimension (metrology)
This definition appears frequently and is found in the following Acronym Finder categories:
- Information technology (IT) and computers
- Science, medicine, engineering, etc.
See other definitions of OCD
We have 149 other meanings of OCD in our Acronym Attic
- Opening Closed Doors
- Operational Capability Demonstration
- Operational Concept Description
- Operational Concept Document
- Operational Control Document
- Operations Capability Development
- Operations Control Directive (NASA)
- Operator Control Display (AEGIS Combat Training System ACTS)
- Optical Communications Demonstrator
- Optical Concentration Device
- Optically Coupled Device
- Optimal Coherent Decomposition
- Optionally Convertible Debenture (finance)
- Order Configuration and Distribution
- Order of Discalced Carmelites (Catholic Order; The Secular Order of Carmel)
- Ordered Constant Depth
- Ordnance Classification of Defects
- Ordnance Clearance Detachment
- Ordre des Cols Durs (France cycling club)
- Organized Crime Division
Samples in periodicals archive:
Joint Development Project Anticipated to Speed Industry Adoption of Optical CD Metrology KLA-Tencor and IMEC, Europe's leading independent nanoelectronics and nanotechnology research center based in Belgium, today announced that they have entered into a joint-development project (JDP) to accelerate the adoption of optical critical dimension (CD) metrology technology for next-generation (65-nm and below) semiconductor applications.
Nanometrics Incorporated (NASDAQ: NANO), a leading provider of advanced process control metrology and inspection systems, today announced its IMPULSE([R]) integrated metrology (IM) system, along with its industry-leading NanoDiffract([R]) software for optical critical dimension (OCD) metrology, have been selected by a leading foundry for deployment into advanced 2x nm volume production for front-end-of-line etch process control.
Nanometrics Incorporated (Nasdaq:NANO), a leading supplier of advanced metrology systems, today announced that its IMPULSE([R]) integrated metrology optical critical dimension (OCD) and film analysis system has been selected by a major Korean memory manufacturer for chemical mechanical planarization (CMP) process control.
Nanometrics Incorporated (Nasdaq:NANO), a leading supplier of advanced metrology systems, today announced that an emerging Asian foundry has selected Atlas XP+ optical critical dimension (OCD) metrology systems for process control of advanced logic devices.
Nanometrics Incorporated (Nasdaq:NANO), a leading supplier of advanced metrology systems, today announced a new release of NanoCD(TM) Suite, a turnkey optical critical dimension (OCD) analysis solution with advanced modeling and recipe building capabilities.
The selection expands on the recent order by the same customer for Nanometrics' Lynx[TM] cluster metrology platform equipped with IMPULSE systems, which was selected for in-line optical critical dimension (OCD) control of etch and lithography applications.
Nanometrics Incorporated (NASDAQ:NANO), a leading provider of advanced process control metrology systems, today announced that a major semiconductor company in Japan has ordered a complete suite of Nanometrics optical critical dimension (OCD) products in support of capacity expansion for devices at the most advanced process nodes.