DigitalOptics solutions include diffractive optical elements (DOEs), such as the lenses used in off-axis illumination for lithography; refractive optical elements (ROEs), such as lens arrays; and integrated micro-optical subassemblies (IMOS), such as optical and electro-optic modules.
For subwavelength designs, Calibre leverages its hierarchical verification engine to provide a tool suite that adds, models and verifies layouts for all four RET techniques: optical and process correction (OPC); phase-shift mask (PSM); scattering bars (SB); and, off-axis illumination (OAI).
For subwavelength designs, Calibre leverages its hierarchical verification engine to provide a tool suite that adds, models and verifies layouts for all four RET techniques: optical and process correction (OPC); phase-shift mask (PSM); scattering bars (SB); and, off-axis illumination (OAI).
For subwavelength designs, Calibre leverages its hierarchical verification engine to provide a tool suite to add, model and verify layouts for all four RET techniques: optical & process correction (OPC), phase-shift mask (PSM), Scattering Bars (SB) and off-axis illumination (OAI), plus the new techniques such as sub-100-nm capable double-exposure dipole decomposition technique currently being refined for production deployment.
For subwavelength designs, Calibre leverages its hierarchical verification engine to provide a tool suite to add, model and verify layouts for all four RET techniques: optical & process correction (OPC), phase-shift mask (PSM), Scattering Bars (SB) and off-axis illumination (OAI), including the new sub-100-nm capable double- exposure dipole decomposition technique currently being refined for production deployment.
