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First-line milling grades, KC915M and KC935M, feature a layer of medium temperature chemical vapor deposition titanium carbonitride (TiCN) and a layer of fine-grain alpha structure aluminum oxide ([AL.
Physical Vapor Deposition (PVD) is a low-temperature process that produces very tough coatings with high lubricity; Medium Temperature Chemical Vapor Deposition (MTCVD) is a medium temperature process that produces tougher, slightly less wear-resistant coatings than the traditional CVD process; Chemical Vapor Deposition (CVD) is a high temperature process that produces highly crater-resistant coatings with a good balance of toughness and wear resistance; and Thick Chemical Vapor Deposition (T-CVD) is a specialized CVD technology that produces very thick coatings which deliver excellent wear and crater resistance, with slightly lower fracture and built-up edge resistance than the standard CVD process.