TrueMask MDP is the First and Only Model-Based Mask Data Preparation Solution to Process Full-Chip Design Data for Production Applications SAN JOSE, Calif.
What does MDP stand for?
MDP stands for Mask Data Preparation
This definition appears frequently and is found in the following Acronym Finder categories:
- Information technology (IT) and computers
See other definitions of MDP
We have 298 other meanings of MDP in our Acronym Attic
- Management Directives and Practices
- Manic Depressive Psychosis
- Marine Debris Program (US NOAA)
- Market Development Partner (Microsoft)
- Marketing Data Platform (data warehousing)
- Markov Decision Problem
- Markov Decision Process (artificial intelligence)
- Marshaled Deployability Posture (STADEPS)
- Marvel Database Project
- Maryland Department of Planning
Samples in periodicals archive:
Synopsys' DFM product family addresses critical manufacturability and yield issues with the following products: IC Compiler physical design solution, PrimeYield LCC, PrimeYield CMP and PrimeYield CAA, Hercules PVS, Proteus OPC, CATS(R) mask data preparation product, SiVL(R) lithography verification tool, patented PSM technology, and physics-based TCAD suite of simulation products.
Applying CATS as mask data preparation software allows users a seamless integration of high precision CD measurements using the WLCD metrology system in their workflow .
As part of the agreement, GLOBALFOUNDRIES has adopted the Mentor Graphics Calibre([R]) platform for the design and verification of complex semiconductor devices along with computational lithography and mask data preparation flows, targeting process technologies of 32/28 nanometers and below.
Synopsys will offer support for ZEISS' PROVE(TM), the next-generation registration metrology tool, through Synopsys' CATS(TM), the technology-leading mask data preparation solution.
MASK (SEMI standard P44) format was performed on Applied's Aera2[TM] advanced mask inspection systems using Mentor Graphics' mask data preparation software technology.
Ferrante Room - Session 6: Mask Data Preparation -"Writing 32-nm HP Contacts with Curvilinear Assist Features" * 5:50 p.
A design environment prototype, offering a first set of design rules with monitoring capabilities and links to mask data preparation tools, was demonstrated during the Euro Nanoelectronics Forum in Paris (December 2-3, 2008).