What does MDP stand for?

As part of the agreement, GlobalFoundries adopted Mentor Graphics's Calibre platform for the design and verification of complex semiconductor devices along with computational lithography and mask data preparation flows, targeting process technologies of 32/28 nm and below.

As part of the agreement, GLOBALFOUNDRIES has adopted the Mentor Graphics Calibre([R]) platform for the design and verification of complex semiconductor devices along with computational lithography and mask data preparation flows, targeting process technologies of 32/28 nanometers and below.

MASK (SEMI standard P44) format was performed on Applied's Aera2[TM] advanced mask inspection systems using Mentor Graphics' mask data preparation software technology.

Easy integration into other tools allows LAVIS to be used as a "standard layout platform" in a wide range of flows including design, verification, mask data preparation, inspection and failure analysis.

Most importantly, LAVIS can be used as the common standard layout platform for all the IC processes such as design, verification, mask data preparation, inspection and failure analysis, thanks to its capability to support various data formats, including the GDSII design format and e-beam formats thereby making it easy to interface with other tools for the entire IC making flow.

Synopsys' DFM product family addresses critical manufacturability and yield issues with the following products: IC Compiler physical design solution, PrimeYield LCC, PrimeYield CMP and PrimeYield CAA, Hercules([TM])PVS, Proteus OPC, CATS([R]) mask data preparation product, SiVL([R]) lithography verification tool, patented PSM technology, and physics-based TCAD suite of simulation products.

The TSMC Blaze enablement project also included the incorporation of Blaze MO annotations into the TSMC RET and mask data preparation flow.

Mentor Graphics Corporation (Nasdaq: MENT) today announced its mask data preparation tool suite, Calibre(R) MDP, has been qualified for production at leading integrated device manufacturers (IDMs) for the 45 nanometer process technology in flows based on OASIS, the next generation stream format.