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Samples in periodicals archive:
Florian, Austria, May 12 /PRNewswire/ -- EV Group (EVG), a leading supplier of wafer bonding and lithography equipment for the MEMS, nanotechnology and semiconductor markets, today announced that Fraunhofer Institute for Applied Optics and Precision Engineering IOF--one of 57 institutes of the Fraunhofer-Gesellschaft dedicated to applied optics and precision applications-oriented research--selected EVG's UV-based nanoimprint lithography (UV-NIL) step and repeat system for its leading-edge optoelectronic research efforts.
The technical innovation of the OSTAR[R] light emitting diode lies in the perfect interplay between various technologies - a new manufacturing process for high-power chips, a perfectly matched package platform, and special optics developed in cooperation with the Fraunhofer Institute for Applied Optics and Precision Engineering.