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4]--C[equivalent to]C--] has been prepared by the condensation of dichlorosilane and lithium salt of diethynylbenzene (4).
Engineered for semiconductor production areas where toxic gases like tungsten hexafluoride and dichlorosilane are an ever-present danger, this new sensor/transmitter team reacts instantly to dangerous gas levels.
4]) can be deposited by means of reaction of dichlorosilane gas (Si[Cl.
Leading Polysilicon Producer Improves Production Employing DEI's Unique Process Technology HOUSTON & HONG KONG -- Dynamic Engineering (DEI), a leading engineering firm in chemical production technologies for electronic and solar grade polysilicon, announced the successful start up of its Dichlorosilane (DCS) Redistribution Process (RDR) at GCL Solar Technologies Holdings Ltd.
Dichlorosilane (DS) plasma modification of sisal fibers was performed by Martin et al.
This unique surface treatment, which can be successfully applied to any geometry, including the critical neck/shoulder and cylinder base areas, enables strict control of trace metal contamination in anhydrous corrosive products such as boron trichloride, chlorine, dichlorosilane, hydrogen bromide and hydrogen chloride.
The traditional dichlorosilane (DCS) ammonia (NH3) process for silicon nitride film deposition temperatures requires temperatures above 630 degrees C.
Dichlorosilane plasma treatment of sisal fibers and polyethylene resulted in poor mechanical properties of their composites, which was attributed to the degradation of the fibers and the melting of the polymer, which would incorporate the functionalized groups in the surface into the bulk of the material (12).