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What does BOX stand for?

Buried Oxide


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This definition appears very rarely and is found in the following Acronym Finder categories:

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Samples in periodicals archive:
SOI simplifies FinFET fabrication: the buried oxide layer acts as an etch-stop and isolates individual transistors; the fin height is a function of the substrate thickness.
The SSDOI structure was created by transferring strained Si grown epitaxially, or layer by layer, on relaxed SiGe to a buried oxide layer.
Leti also showed that fully depleted SOI (FDSOI) CMOS can be scaled down to the 10nm node through tuning the buried oxide and silicon layer thickness.
The buried oxide layer acts as a barrier that reduces electrical leakage from the transistors, resulting in semiconductor devices that are faster and more power efficient.
The buried oxide layer acts as a barrier that reduces electrical leakage from the transistors, resulting in semiconductor devices that are faster and more power efficient.
The SOI body thickness is 45nm on a 150nm buried oxide layer, and source/drain and gates are cobalt silicided.
The buried oxide layer acts as a barrier that reduces electrical leakage from the transistors, resulting in semiconductor devices that are faster and more power efficient.
How IBM Created the First Transistor with Strained Silicon Directly on Insulator Technology The SSDOI structure was created by transferring strained Si grown epitaxially, or layer by layer, on relaxed SiGe to a buried oxide layer.

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