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What does ACVD stand for?

ACVD stands for Atmospheric Chemical Vapor Deposition (coating technology)

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We have 2 other meanings of ACVD in our Acronym Attic

Samples in periodicals archive:

Required processes for fabricating the NMOS spherical semiconductor included spherical single crystallization, spherical silicon surface polishing, integrated circuit design on the sphere with mask data generation and fabrication, spherical lithography with alignment of balls, etching and probe-testing of the transistor, spherical resist coating, high temperature oxidation at 1300 degrees Celsius and atmospheric chemical vapor deposition.
Required processes for fabricating the spherically-placed NMOS transistor include mask data generation and fabrication using the five-micron design rule, atmospheric Chemical Vapor Deposition (CVD), high-temperature oxidation at 1250 degrees Celsius, spherical resist-coating process, spherical lithography, etching and probe-testing of the transistor.
Aviza Technology's overall IP portfolio covers method and apparatus patents in the areas of atmospheric chemical vapor deposition (APCVD), low-pressure chemical vapor deposition (LPCVD), high temperature oxidation and diffusion, low-k dielectric films, chemical mechanical polishing (CMP), and atomic layer deposition (ALD).