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What does ArF stand for?

Argon Fluoride


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This definition appears very rarely and is found in the following Acronym Finder categories:

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Approved Retirement Fund (UK)
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Archaeological Research Facility
Architecture Register File
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Archive and Retrieval Facility
Area Resource File
Area Resource File (US Health Resources and Services Administration)
Argentina Peso Fuerte (national currency 1852-1875)
Armenian Relief Fund
Armenian Revolutionary Federation (Armenian political party)
Armour Research Foundation (Illinois Institute of Technology)
ASEAN Regional Forum
Asoziale Randgruppe Frankfurt (hacker group)
Assistant Regional Forester
Association des Régions de France (French: Association of Regions of France; est. 1998)
Association des Rhumatologues en Formation (French: Association of Rheumatologists in Training)
Association des Ruralistes Français (French: French Ruralists Association; est. 1974)
Asthma and Respiratory Foundation



Samples in periodicals archive:
We extended our argon fluoride (ArF) immersion market leadership and made continued progress towards the development and commercialization of our extreme ultraviolet (EUV) light source technology.
The two companies will work on both argon fluoride (ArF) excimer laser and extreme ultraviolet (EUV) lithography.
The new argon fluoride laser (which the company prefers to call a "light source") is designated model XLA 100.
Most of the equipment orders we are receiving have been for leading edge argon fluoride (ArF) XLR 500i, XLR 500d, and XLR 600i immersion light sources, with the logic sector accounting for the majority of the demand.
Byline: kavita03 in semiconductor lithography, today announced that a major scanner manufacturer has placed an order for two XLR 600i light sources, the market s first 90 watt (W) argon fluoride (ArF) laser designed to enable volume immersion and double patterning lithography at the 32nm node and beyond.
Today's most advanced lithography systems use an Argon Fluoride produced laser with a wavelength of 193 nm.
Under the agreement, Toshiba will include Cymer's krypton fluoride (KrF) and argon fluoride (ArF) light sources in Toshiba's future 300mm investment plan at its memory fab in Japan.
Nasdaq:CYMI), the market's leading developer of light sources used to create advanced semiconductor chips, has unveiled the XLR 500d--an argon fluoride (ArF) laser light source for 32 nanometer (nm) dry lithography.

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